Trichlorosilane, with the CAS number 10025 - 78 - 2, is a colorless, volatile liquid with a pungent odor. It is highly reactive and flammable. The molecular formula is SiHCl₃, and its molecular weight is approximately 135.45 g/mol. The density of trichlorosilane is about 1.34 g/cm³ at 20°C, and it has a boiling point of around 31.8°C. It is soluble in organic solvents but reacts violently with water, releasing hydrogen chloride gas.
Trichlorosilane has a wide range of applications in various industries. In the semiconductor industry, it is a key raw material for the production of polysilicon, which is used to manufacture silicon wafers for integrated circuits and solar cells. High - purity trichlorosilane is essential for producing high - quality polysilicon with low impurity levels. In the chemical industry, it can be used as a reducing agent in some chemical reactions. It is also used in the synthesis of organosilicon compounds, such as silicones, which have applications in sealants, lubricants, and coatings due to their excellent thermal stability, water - repellency, and electrical insulation properties.
When using trichlorosilane, strict safety precautions must be taken. It should be handled in a well - ventilated area, preferably in a fume hood, to prevent the inhalation of toxic fumes. Workers should wear appropriate personal protective equipment, including chemical - resistant gloves, goggles, and a respirator. Before use, the containers should be inspected for any signs of damage or leakage. Trichlorosilane should be stored in a cool, dry place away from heat sources, oxidizing agents, and water. When transferring trichlorosilane, use appropriate transfer equipment designed for handling hazardous chemicals. In the semiconductor manufacturing process, trichlorosilane is usually vaporized and introduced into a reactor, where it undergoes a chemical reaction to deposit polysilicon on a substrate under controlled temperature and pressure conditions.
1. Semiconductor Manufacturing Case: A well - known semiconductor company was facing challenges in producing high - purity polysilicon for their advanced integrated circuits. They switched to using our high - quality factory - supplied trichlorosilane. By precisely controlling the reaction conditions in their CVD (Chemical Vapor Deposition) reactors, they were able to achieve a significant improvement in the quality of the deposited polysilicon. The reduction in impurity levels led to a higher yield of functional integrated circuits, resulting in increased production efficiency and reduced costs.
2. Organosilicon Compound Synthesis Case: A chemical company specializing in the production of silicone sealants was looking for a cost - effective and high - quality trichlorosilane source. After using our product, they found that the synthesis process became more stable. The resulting silicone sealants had better adhesion and durability, which led to an expansion of their market share in the construction and automotive industries.
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