Hexachlorodisilane, with the CAS number 13465-77-5, is a significant chemical product in the field of silicon - based compounds. It appears as a colorless to slightly yellowish liquid under normal conditions. This product is known for its relatively low vapor pressure, which affects its handling and storage requirements.
The molecular formula of Hexachlorodisilane is Cl₆Si₂, and its molecular weight is approximately 268.89 g/mol. It has a high density of around 1.69 g/cm³, indicating its relatively heavy nature compared to some other common solvents. The boiling point of this compound is about 144 - 146°C, and the melting point is - 74°C. These physical properties make it suitable for various industrial applications.
Our factory offers this product at a low price, ensuring high - quality supply. It is produced under strict quality control measures to meet the diverse needs of our customers.
Hexachlorodisilane has a wide range of uses in different industries. In the semiconductor industry, it is an important precursor for the deposition of silicon - containing thin films. Chemical Vapor Deposition (CVD) processes frequently utilize Hexachlorodisilane to form silicon - based layers on semiconductor wafers. These thin films are crucial for the fabrication of integrated circuits, transistors, and other semiconductor devices.
In the field of materials science, it can be used as a raw material for the synthesis of silicon - carbide or other silicon - rich ceramic materials. During the synthesis process, it reacts with other substances under specific conditions to form new materials with excellent mechanical, thermal, and electrical properties.
When handling Hexachlorodisilane, it should be stored in a cool, dry place away from heat sources and oxidizing agents. It is highly reactive with water and moisture, so it must be kept in air - tight containers. Appropriate personal protective equipment, such as chemical - resistant gloves, goggles, and respirators, should be worn during handling to prevent exposure to the skin, eyes, and respiratory tract.
Case 1: Semiconductor Manufacturing
A leading semiconductor company used our Hexachlorodisilane in their CVD process for the production of high - performance microprocessors. By carefully controlling the flow rate and reaction conditions, they were able to deposit a uniform and high - quality silicon - containing thin film on the wafer surface. This led to improved electrical performance and reduced defect rates in the final microprocessors. The low price of our product also helped them to reduce production costs significantly.
Case 2: Ceramic Material Synthesis
A research institution was working on developing a new type of silicon - carbide ceramic with enhanced thermal conductivity. They used Hexachlorodisilane as one of the key starting materials. Through a series of chemical reactions and high - temperature sintering processes, they successfully synthesized a ceramic material with excellent thermal properties. The high purity of our product ensured the quality and reproducibility of the synthesis process.
If you have any questions or need more information about our Hexachlorodisilane product, please feel free to contact us:
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Este é o William, Diretor Executivo da Zhishang Chemical Co., Ltd.
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